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Montaje y optimización de un sistema de pulverización catódica de alta presión de silicio amorfo hidrogenado (Assembly and optimizatión of a high pressure sputtering system for hydrogenated amorphous silicon)

García Hernansanz, Rodrigo (2012) Montaje y optimización de un sistema de pulverización catódica de alta presión de silicio amorfo hidrogenado (Assembly and optimizatión of a high pressure sputtering system for hydrogenated amorphous silicon). Tesis Master's thesis.

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El mapa energético actual se presenta complicado. Frente al crecimiento actual de la demanda de energía y los recursos energéticos, la conversión fotovoltaica aparece como una energía limpia, renovable y realista para dar solución a los problemas energéticos futuros.
En la actualidad se está trabajando en la fabricación de una tercera generación de células fotovoltaicas. La integración de materiales con una banda de estados
permitidos dentro del gap de energías prohibidas (Banda intermedia) es uno de los caminos posibles.
En el presente trabajo de investigación se depositarán y caracterizarán láminas delgadas de silicio amorfo tipo p crecidas mediante la técnica de pulverización catódica
para su posterior aplicación en células solares de estructura HIT. Concretamente se montará un sistema de pulverización catódica y se depositarán láminas delgadas de
silicio amorfo hidrogenado sobre dos tipos de sustrato, vidrio y silicio, con el objeto de caracterizar el material depositado.
Mediante las medidas realizadas se estudiarán los parámetros de depósito de nuestras láminas, así como comprobar sus características y compatibilidades con la
estructura HIT. [ABSTRACT] The new energy map shows complex. Faced with the growth of energy demand
and energy resources, photovoltaic conversion is presented as a clean energy, renewable and realistic for solving future energy problems.
Currently we are working on making a third generation photovoltaic cells. The integration of materials with a band of allowed states in the forbidden energy band gap
(intermediated band) is one of the possible paths.
This research will study thin films of p-type amorphous silicon grown by sputtering technique for further application in HIT structure solar cells. Specifically we will assemble a sputtering system and will growth thin films on two types of substrate, glass and silicon,
in order to characterize the material deposited. By the measurements we will study growth parameters of our films and their features and compatibility with the HIT structure.

Item Type:Thesis (Master's thesis)
Additional Information:Máster en Física Aplicada. Facultad de Ciencias Físicas. Curso 2011-2012
DirectorsDirector email
Olea Ariza,
Pastor Pastor,
Uncontrolled Keywords:Energía Solar Fotovoltaica, Semiconductores, Láminas Delgadas, Materiales de Banda Intermedia, Pulverización Catódica, Silicio Amorfo Hidrogenado, Alta Presión, Células HIT (Heterojuccion with Intrinsic Thin Layer),Photovoltaic Solar Energy, Semiconductors, Thin Films, Intermediate Band Materials, Sputtering, Hydrogenated Amorphous Silicon, High Pressure,HIT Cells. V
Subjects:Sciences > Physics > Electronics
Sciences > Physics > Electricity
ID Code:15865

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Deposited On:30 Jul 2012 09:10
Last Modified:01 Aug 2012 09:18

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