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Characterization of photonic crystal microcavities with manufacture imperfections

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Rico-García, José María and López-Alonso, José Manuel and Alda, Javier (2005) Characterization of photonic crystal microcavities with manufacture imperfections. Optics Express, 13 (10). pp. 3802-3815. ISSN 1094-4087

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Official URL: http://dx.doi.org/10.1364/OPEX.13.003802




Abstract

The manufacture of a photonic crystal always produce deviations from the ideal case. In this paper we present a detailed analysis of the influence of the manufacture errors in the resulting electric field distribution of a photonic crystal microcavity. The electromagnetic field has been obtained from a FDTD algorithm. The results are studied by using the Principal Component Analysis method. This approach quantifies the influence of the error in the preservation of the spatial-temporal structure of electromagnetic modes of the ideal microcavity. The results show that the spatial structure of the excited mode is well preserved within the range of imperfection analyzed in the paper. The deviation from the ideal case has been described and quantitatively estimated.


Item Type:Article
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Es una versión postprint.
La versión publicada está en Open Access en la web del editor.
© 2005 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.

Uncontrolled Keywords:Micro-Optics; Microstructured devices; Probability theory; Stochstic processes
Subjects:Sciences > Physics
Sciences > Physics > Electromagnetism
Sciences > Physics > Optics
Sciences > Chemistry > Crystallography
Medical sciences > Optics > Physical optics
ID Code:35191
Deposited On:28 Jan 2016 10:13
Last Modified:05 Feb 2016 12:23

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