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Characterization of photonic crystal microcavities with manufacture imperfections

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Rico-García, José María y López-Alonso, José Manuel y Alda, Javier (2005) Characterization of photonic crystal microcavities with manufacture imperfections. Optics Express, 13 (10). pp. 3802-3815. ISSN 1094-4087

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URL Oficial: http://dx.doi.org/10.1364/OPEX.13.003802




Resumen

The manufacture of a photonic crystal always produce deviations from the ideal case. In this paper we present a detailed analysis of the influence of the manufacture errors in the resulting electric field distribution of a photonic crystal microcavity. The electromagnetic field has been obtained from a FDTD algorithm. The results are studied by using the Principal Component Analysis method. This approach quantifies the influence of the error in the preservation of the spatial-temporal structure of electromagnetic modes of the ideal microcavity. The results show that the spatial structure of the excited mode is well preserved within the range of imperfection analyzed in the paper. The deviation from the ideal case has been described and quantitatively estimated.


Tipo de documento:Artículo
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Es una versión postprint.
La versión publicada está en Open Access en la web del editor.
© 2005 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.

Palabras clave:Micro-Optics; Microstructured devices; Probability theory; Stochstic processes
Materias:Ciencias > Física
Ciencias > Física > Electromagnetismo
Ciencias > Física > Optica
Ciencias > Química > Cristalografía
Ciencias Biomédicas > Óptica y optometría > Óptica física, óptica cuántica
Código ID:35191
Depositado:28 Ene 2016 10:13
Última Modificación:05 Feb 2016 12:23

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