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Prado Millán, Álvaro del and San Andres Serrano, Enrique and Mártil de la Plaza, Ignacio and González Díaz, Germán and Kliefoth, K. and Füssel, W. (2004) Annealing effects on the interface and insulator properties of plasma-deposited Al/SiOxNyHz/Si devices. Semiconductor Science and Technology, 19 (2). pp. 133-141. ISSN 0268-1242

This list was generated on Wed Jun 26 18:29:20 2019 CEST.