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Improvement of SiNx : H/InP gate structures for the fabrication of metal-insulator-semiconductor field-effect transistors

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Redondo, E. and Mártil de la Plaza, Ignacio and González Díaz, Germán and Fernández Sánchez, Paloma and Cimas Cuevas, María Rosa (2002) Improvement of SiNx : H/InP gate structures for the fabrication of metal-insulator-semiconductor field-effect transistors. Semiconductor Science and Technology, 17 (7). pp. 672-676. ISSN 0268-1242

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Official URL: http://dx.doi.org/10.1088/0268-1242/17/7/306


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Abstract

In this paper we report on the optimization of the SiNchi:H insulator, deposited by the electron cyclotron resonance (ECR) plasma method, as a dielectric for metal-insulator-semiconductor (MIS) structures built on an InP compound semiconductor. Two different MIS structures have been obtained in which the minimum of the interface trap density (D-it,D-min) at the insulator/InP interface attains values of device quality. In the first structure, a Al/SiN1.5:H/SiN1.6:H/InP dual-layer insulator was obtained and optimized after rapid thermal annealing treatment at 500 degreesC for 30s. After this treatment, the value of D-it,D-min was 9 x 10(11) cm(-2) eV(-1). In the second structure, the MIS structure was Al/SiN1.6:H/InP single-layer insulator, in which the InP surface was exposed to an N-2 plasma prior to the SiN1.6:H film deposition. In this case, the value of D-it.min was 1.6 x 10(12) cm(-2) eV(-1). Both types of structures were used as gate insulators on N-channel enhanced-mode MIS field-effect transistor test devices. From the dc output characteristics of the transistors, we obtain values for the electron channel mobility in the range 1550-1600 cm(-2) V-1 s(-1). This is a confirmation of the great potential of the ECR plasma method as a simple way to obtain device quality gate structures on InP without the use of passivation processes of the InP surface prior to the deposition of the gate dielectric, thus simplifying the whole device fabrication procedure.


Item Type:Article
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© 2002 IOP Publishing Ltd. This work was partially supported by the Spanish Government under Grant No TIC98/0740.

Uncontrolled Keywords:Level Transient Spectroscopy, Chemical-Vapor-Deposition, Electrical-Properties, Devices, InP.
Subjects:Sciences > Physics > Electricity
Sciences > Physics > Electronics
ID Code:26219
Deposited On:11 Jul 2014 08:40
Last Modified:10 Dec 2018 14:58

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