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Continuous self-imaging regime with a double-grating mask

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Sánchez Brea, Luis Miguel and Torcal Milla, Francisco José and Bernabeu Martínez, Eusebio (2009) Continuous self-imaging regime with a double-grating mask. Applied Optics, 48 (30). pp. 5722-5727. ISSN 1559-128X

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Official URL: http://dx.doi.org/10.1364/AO.48.005722


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Abstract

We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations with phase and amplitude gratings have been studied in the near-field regime. For a two-phase-gratings configuration, the Talbot effect is canceled, even when using monochromatic light; that is, the intensity distribution is nearly independent of the distance from the mask to the observation plane. Therefore, the mechanical tolerances of devices that use the Talbot effect may be improved. In addition, the spatial frequency of the fringes is quadrupled, which improves the accuracy of devices that employ this mask. An experimental verification for the best case two phase gratings, has also been performed, validating the theoretical results.


Item Type:Article
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© 2009 Optical Society of America.
This work has been supported by project CCG08-UCM/DPI-3952 of Dirección General de Universidades e Investigación de la Consejería de Educación de la Comunidad de Madrid y Universidad Complutense de Madrid and Consorcios Estratégicos Nacionales de Investigación Tecnología project “Tecnologías avanzadas para los equipos y procesos de fabricación de 2015. e-eficiente, e-cológica, e-máquina (eEe)” of the Ministerio de Industria, Turismo y Comercio.

Uncontrolled Keywords:Light-Source, Talbot
Subjects:Sciences > Physics > Optics
ID Code:26221
Deposited On:17 Jul 2014 11:51
Last Modified:17 Jul 2014 11:51

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