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Optical spectroscopic study of the growth dynamics of radio-frequency-sputtered YBa2Cu3O(7-x) thin films

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Mártil de la Plaza, Ignacio and González Díaz, Germán and Hernández Rojas, J. L. and Lucía Mulas, María Luisa and Sánchez Quesada, Francisco and Santamaría Sánchez-Barriga, Jacobo (1992) Optical spectroscopic study of the growth dynamics of radio-frequency-sputtered YBa2Cu3O(7-x) thin films. Applied physics Letters, 61 (2). pp. 231-233. ISSN 0003-6951

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Official URL: http://dx.doi.org/10.1063/1.108193


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Abstract

An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen.


Item Type:Article
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© American Institute of Physics.

Uncontrolled Keywords:Physics, Applied.
Subjects:Sciences > Physics > Electricity
Sciences > Physics > Electronics
ID Code:27131
Deposited On:20 Oct 2014 08:59
Last Modified:10 Dec 2018 14:58

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