Publication: Optical spectroscopic study of the growth dynamics
of radio-frequency-sputtered YBa2Cu3O(7-x) thin films
Loading...
Official URL
Full text at PDC
Publication Date
1992-07-13
Advisors (or tutors)
Editors
Journal Title
Journal ISSN
Volume Title
Publisher
Amer Inst Physics
Citations
Exportar
Abstract
An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen.
Description
© American Institute of Physics.
UCM subjects
Unesco subjects
Keywords
Citation
1) S.I. Shah and P.F. García, Appl. Phys. Lett., 51, 2146 (1987).
2) S.M. Rossnagel and J.J. Cuomo, Am. Inst. Phys. Conf. Proc., 165, 106 (1988).
3) T.I. Selinder, G. Larsson, and U. Helmersson, J. Appl. Phys., 69, 390 (1990).
4) M. Migliuolo, R.M. Belan, and J.A. Brewer, Appl. Phys. Lett., 56, 2572 (1990).
5) J.D. Klein and A. Yen, Appl. Phys. Lett., 55, 2670 (1989).
6) X.X. Xi, X.D. Wu, A. Inam, Q. Li, D. Hemmick, and A. Findikoglu, Appl. Phys. Lett., 57, 96 ( 1990).
7) X.D. Wu, B. Dutta, M.S. Hedge, A. Inam, T. Venkatesan, E.W. Chase, C.C. Chang, and R. Howard, Appl. Phys. Lett., 54, 179 (1989).
8) K.Y. Yang, H. Homma, R. Lee, R. Bhadra, M. Grimsditch, S.D. Bader, J.P. Locquet, Y. Bruynseraede, and I.K. Schuller, Appl. Phys. Lett., 53, 808 (1988).
9) R.H. Hammond and R. Bormann, Physica C, 162-164, 703 (1989).