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Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray

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Ginn, James and Alda, Javier and Gómez Pedrero, José Antonio and Boreman, Glenn (2010) Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray. Optics Express, 18 (11). pp. 10931-10940. ISSN 1094-4087

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Official URL: http://www.opticsexpress.org/abstract.cfm?URI=oe-18-11-10931



Abstract

The monochromatic aberrations produced by the phase distribution reflected by resonant sub-wavelength metallic structures are studied both analytically and numerically. Even for normal incidence, the angular dependence of the re-radiated wavefront disturbs the overall performance of the reflectarray. This effect is modelled as combination of a linear and a cubic dependence. A complete numerical simulation of a multilevel focusing reflectarray is performed using computational-electromagnetic and physical-optics-propagation methods. A modified Strehl ratio is defined to show the dependence of the focused spot behavior on aperture. The irradiance distribution is dependent on the polarization state. A small-aperture focusing reflectarray has been designed, fabricated, and tested. The irradiance distribution at the focusing plane is compared with the simulated one, showing a good agreement when residual wavefront aberrations are included.


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© 2010 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.

Uncontrolled Keywords:materials; metamaterials; diffraction and gratings; phase shift; imaging systems; infrared imaging
Subjects:Sciences > Physics > Electromagnetism
Sciences > Physics > Optics
ID Code:36467
Deposited On:05 Apr 2016 17:13
Last Modified:13 Apr 2016 10:34

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