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Micromachined silicon lenses for terahertz applications



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Bueno, Juan y López Camacho, Elena y Silva-López, Manuel y Rico-García, José María y Llombart, N y Alda, Javier y Costa-Krämer, José Luis (2013) Micromachined silicon lenses for terahertz applications. Infrared Physics & Technology, 61 . pp. 144-148. ISSN 1350-4495

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URL Oficial: http://dx.doi.org/10.1016/j.infrared.2013.08.002


Silicon microlenses are a very important tool for coupling terahertz (THz) radiation into antennas and detectors in integrated circuits. They can be used in a large array structures at this frequency range reducing considerably the crosstalk between the pixels. Drops of photoresist have been deposited and their shape transferred into the silicon by means of a Reactive Ion Etching (RIE) process. Large silicon lenses with a few mm diameter (between 1.5 and 4.5 mm) and hundreds of μm height (between 50 and 350 μm) have been fabricated. The surface of such lenses has been characterized using Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM), resulting in a surface roughness of about ∼3 μm, good enough for any THz application. The beam profile at the focal plane of such lenses has been measured at a wavelength of 10.6 μm using a tomographic knife-edge technique and a CO2 laser.

Tipo de documento:Artículo
Información Adicional:

Received 4 May 2012, Available online 22 August 2013

Palabras clave:Microfabricated lenses; Silicon lenses; Beam pattern; Surface characterisation; THz spectroscopy
Materias:Ciencias > Física > Física de materiales
Ciencias Biomédicas > Óptica y optometría > Óptica geométrica e instrumental
Ciencias Biomédicas > Óptica y optometría > Láseres
Código ID:38641
Depositado:08 Sep 2016 11:46
Última Modificación:19 Sep 2016 10:46

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