Publication: Epitaxial integration of CoFe₂O₄ thin films on Si (001) surfaces using TiN buffer layers
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Publication Date
2018-04-01
Authors
Prieto, Pilar
Marco, F.
Prieto, José E.
Perez del Real, Rafael
Velazquez, Manuel
De laFiguera, Juan
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Elsevier Science B. V.
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Abstract
Epitaxial cobalt ferrite thin films with strong in-plane magnetic anisotropy have been grown on Si (001) substrates using a TiN buffer layer. The epitaxial films have been grown by ion beam sputtering using either metallic, CoFe₂, or ceramic, CoFe₂2O₄, targets. X-ray diffraction (XRD) and Rutherford spectrometry (RBS) in random and channeling configuration have been used to determine the epitaxial relationship CoFe₂O₄ [100]/TiN [100]/Si [100]. Mossbauer spectroscopy, in combination with XRD and RBS, has been used to determine the composition and structure of the cobalt ferrite thin films. The TiN buffer layer induces a compressive strain in the cobalt ferrite thin films giving rise to an in-plane magnetic anisotropy. The degree of in- plane anisotropy depends on the lattice mismatch between CoFe₂O₂ and TiN, which is larger for CoFe₂O₄ thin films grown on the reactive sputtering process with ceramic targets.
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©2017 Elsevier B.V. All rights reserved.
This work was supported by the Spanish Ministry of Economy under the project number MAT2015-64110-CO2.