Silicon oxides as alignment surfaces for vertically-aligned nematics in photonic devices

Downloads

Downloads per month over past year

63896

Impacto

Downloads

Downloads per month over past year

Otón, Eva and López Andrés, Sol and Bennis, Noureddine and Otón Sánchez, José Manuel and Geday, M. A. (2014) Silicon oxides as alignment surfaces for vertically-aligned nematics in photonic devices. Opto-Electronics Review, 22 (2). pp. 92-100. ISSN 1230-3402

[thumbnail of Silicon oxides as alignment.pdf] PDF
Creative Commons Attribution Non-commercial No Derivatives.

2MB

Official URL: https://link.springer.com/journal/11772/volumes-and-issues/22-2



Abstract

A comparative study on alignment performance and microstructure of inorganic layers used for liquid crystal cell conditioning has been carried out. The study has focused on two specific materials, SiOx and SiO2, deposited under different conditions. The purpose was to establish a relationship between layer microstructure and liquid crystal alignment. The surface morphology has been studied by FESEM and AFM. An analysis on liquid crystal alignment, pretilt angle, response time, contrast ratio and the conditions to develop backflow effect (significant rise time increase due to pure homeotropic alignment) on vertically-aligned nematic cells has been carried out. A technique to overcome the presence of backflow has been identified. The full comparative study of SiOx and SiO2 layer properties and their influence over liquid crystal alignment and electrooptic response is presented


Item Type:Article
Uncontrolled Keywords:SiOx; SiO2; Silicon oxides; Vertically aligned nematics; Photonic devices; Morphology characterization
Subjects:Sciences > Geology > Crystallography
Sciences > Geology > Mineralogy
ID Code:63896
Deposited On:15 Feb 2021 06:48
Last Modified:15 Feb 2021 08:53

Origin of downloads

Repository Staff Only: item control page